发明名称 CHEMICALLY-AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERNING PROCESS USING THE SAME
摘要 The present invention provides a chemically-amplified negative resist composition including a sulfonium salt capable of providing a pattern having an extremely high resolution with reduced line edge roughness, and also provides a resist patterning process using the same.;The present invention was accomplished by a chemically-amplified negative resist composition including (A) a salt represented by the following general formula (1) and (B) a resin containing one or more kinds of repeating unit represented by the following general formulae (UN-1) and (UN-2) and a resist patterning process using the same.;
申请公布号 US2015268556(A1) 申请公布日期 2015.09.24
申请号 US201514637013 申请日期 2015.03.03
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 DOMON Daisuke;MASUNAGA Keiichi;WATANABE Satoshi
分类号 G03F7/038;G03F7/20;G03F7/30 主分类号 G03F7/038
代理机构 代理人
主权项 1. A chemically-amplified negative resist composition for high energy beam exposure comprising: (A) a salt represented by the following general formula (1); and (B) a resin containing one or more kinds of repeating units represented by the following general formulae (UN-1) and (UN-2),wherein R0 represents a hydrogen atom, or a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included; each R01 and R02 independently represents a hydrogen atom, or a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included, and R01 and R02 may mutually be bonded to form a cyclic structure together with a carbon atom bonded by the same and a carbon atom between the same, and at least one of R0, R01 and R02 has a cyclic structure; each R101, R102 and R103 independently represents a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included, and two or more of R101, R102 and R103 may mutually be bonded to form a cyclic structure together with a sulfur atom in the formula; and L represents a single bond or any of an ester bond, a sulfonic acid ester bond, a carbonate bond and a carbamate bond each of which is formed together with an adjacent oxygen atom,wherein each A and B represents a single bond or an alkylene group having 1 to 10 carbon atoms that may contain an ether bond in a chain of the alkylene group; each R1 independently represents a hydrogen atom or a methyl group; Rx represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; X represents a hydrogen atom, a linear, a branched or a cyclic alkyl group, substituted or unsubstituted, having 1 to 20 carbon atoms, an alkoxyalkyl group having 2 to 20 carbon atoms, an alkylthioalkyl group having 2 to 20 carbon atoms, a halogen atom, a nitro group, a cyano group, a sulfinyl group, or a sulfonyl group; Y represents an alkyl group having 1 to 20 carbon atoms or an acyl group having 1 to 20 carbon atoms; “a” and “c” represent an integer of 0 to 4; “b” represents an integer of 1 to 5; “d” represents an integer of 0 to 5; P and Q represent 0 or 1; and “s” and “t” represent an integer of 0 to 2.
地址 Tokyo JP