发明名称 METHOD FOR PREPARING GRAPHENE USING OVERLAPPING AND METHOD FOR FABRICATING ELECTRONICS COMPRISING THE GRAPHENE
摘要 The present invention relates to a graphene preparing method. The method includes the steps of: stacking and overlapping thin-films having a metal catalyst layer to prepare an overlapped body (step a); and conducting a chemical vapor deposition operation to prepare graphene on the metal catalyst layer (step b). The present invention can promote movement of metal catalyst molecules in a chemical vapor deposition apparatus and prevent evaporation of a metal catalyst by using the influence of an overlapped substrate. The present invention also reduces the size of grain boundaries which are micro units on the surface of the metal catalyst to enhance transparency. The present invention can also synthesize graphene sheets grown at various carbon source gas concentration rates. The present invention also enables mass production within a limited space in the chemical vapor deposition apparatus efficiently.
申请公布号 KR20150106984(A) 申请公布日期 2015.09.23
申请号 KR20140028815 申请日期 2014.03.12
申请人 CENTER FOR ADVANCED SOFT ELECTRONICS 发明人 CHO, KIL WON;BONG, HYO JIN
分类号 C01B31/02;B01J23/00;B01J23/42;C23C16/26 主分类号 C01B31/02
代理机构 代理人
主权项
地址