发明名称 |
PLASMA GENERATION DEVICE, VAPOR DEPOSITION DEVICE, AND VAPOR DEPOSITION METHOD |
摘要 |
<p>There is provided a plasma generation apparatus capable of forming plasma suitable for a plasma assist method. The plasma generation apparatus includes a chamber 2, a plasma gun 3 arranged so as to face an inside of the chamber 2, and having a cathode 7 for emitting electrons and a convergent coil 11 for forming a magnetic flux to guide the electrons emitted by the cathode 7, and an auxiliary magnet 4 for forming a magnetic flux in the chamber 2, in which an excitation current is applied to the convergent coil 11 so as to vary a direction of the magnetic flux.</p> |
申请公布号 |
EP2838324(A4) |
申请公布日期 |
2015.09.23 |
申请号 |
EP20130776393 |
申请日期 |
2013.02.27 |
申请人 |
CHUGAI RO CO., LTD. |
发明人 |
FURUYA, EIJI;AKANO, SHINYA |
分类号 |
H05H1/50;C23C14/32;C23C14/48;H01J37/32 |
主分类号 |
H05H1/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|