发明名称 |
Composition for titanium nitride hard mask and etch residue removal |
摘要 |
Aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing etch residue are low pH aqueous composition comprising solvent, a weakly coordinating anion, amine, and at least two non-oxidizing trace metal ions. The aqueous compositions contain no non-ambient oxidizer, and are exposed to air. Bifluoride, or metal corrosion inhibitor may be added to the aqueous composition. Systems and processes use the aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing titanium nitride (TiN or TiNxOy) etch residue. |
申请公布号 |
EP2922086(A1) |
申请公布日期 |
2015.09.23 |
申请号 |
EP20140198123 |
申请日期 |
2014.12.16 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
CASTEEL JR., WILLIAM JACK;INAOKA, SEIJI;RAO, MADHUKAR BHASKARA;ROSS, BRENDA FAYE;LEE, YI-CHIA;LIU, WEN DAR;CHEN, TIANNIU |
分类号 |
H01L21/3213;C09K13/00;H01L21/02;H01L21/311 |
主分类号 |
H01L21/3213 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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