发明名称 ETCHING SOLUTION COMPOSITION FOR COPPER LAYER AND TITANIUM LAYER AND METHOD OF PREPARING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
摘要 <p>The present invention relates to an etching solution composition for a copper film and a titanium film, and a method of preparing an array substrate for a liquid crystal display using the same. More specifically, the present invention relates to an etching solution composition for a copper film and a titanium film and a method of preparing an array substrate for a liquid crystal display using the same, wherein the etching solution composition includes persulfate and sulfosalicylic acid to be environmentally friendly and have excellent heating control performance; to quickly, uniformly, and simultaneously etch a plurality of metal films made up by copper films and titanium films; and to have temporal stability.</p>
申请公布号 KR20150107207(A) 申请公布日期 2015.09.23
申请号 KR20140029753 申请日期 2014.03.13
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 YU, IN HO;KUK, IN SEOL
分类号 C23F1/38;C23F1/34;C23F1/40 主分类号 C23F1/38
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