Method for adjusting an optical system of a microlithographic projection exposure apparatus

摘要

A method for adjusting an optical system in a microlithographic projection exposure apparatus includes establishing, for a given actual position of a polarization-influencing component, a distribution of IPS values in a pupil plane of the projection exposure apparatus. Each IPS value denotes the degree of realization of a predetermined polarization state for a light ray reflected at a respective mirror element of the mirror arrangement. The method also includes changing the position of the polarization-influencing component on the basis of the established distribution.

主权项

1. A method of adjusting an optical system in a microlithographic projection exposure apparatus, wherein:
the optical system comprises:
a mirror arrangement comprising a plurality of mirror elements which are adjustable independently from one another to change an angular distribution of light reflected by the mirror arrangement; anda polarization-influencing optical arrangement comprising a polarization-influencing component configured so that displacing the polarization-influencing component varies a degree of overlap between the polarization-influencing component and the mirror arrangement; and the method comprises:
a) establishing, for a given actual position of the polarization-influencing component, a distribution of IPS values in a pupil plane of the projection exposure apparatus, each IPS value denoting a degree of realization of a predetermined polarization state for a light ray reflected at a respective mirror element of the mirror arrangement; andb) changing the position of the polarization-influencing component based on the distribution established in a).