发明名称 Illumination optical apparatus and projection exposure apparatus
摘要 An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle onto a wafer are provided. An illumination light emitted from an exposure light source in a linearly polarized state in the illumination optical system passes through first and second birefringent members having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle under an annular illuminating condition after passing through a fly-eye lens.
申请公布号 US9140992(B2) 申请公布日期 2015.09.22
申请号 US200611410952 申请日期 2006.04.26
申请人 NIKON CORPORATION 发明人 Shiraishi Naomasa
分类号 G03B27/72;G03F7/20;G02B27/28;G03B27/68;G03B27/42;G03B27/52;G03B27/54 主分类号 G03B27/72
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A projection exposure apparatus which projects an image of a pattern on a first object onto a second object, the projection exposure apparatus comprising: a projection optical system arranged between the first object and the second object that projects the image of the pattern on the first object onto the second object; and an illumination optical system that illuminates the first object with illumination light from a light source, and comprising at least two birefringent members arranged along a traveling direction of the illumination light, wherein a direction of a fast axis of an at least one birefringent member of the at least two birefringent members is different from a direction of a fast axis of another birefringent member of the at least two birefringent members, wherein the at least one birefringent member of the at least two birefringent members has a non-uniform surface; and the at least one birefringent member changes a polarization state of the illumination light passing the at least one birefringent member to consist primarily of S-polarization when the illumination light reaches the first object after the illumination light entering into the at least one birefringent member passes the at least one birefringent member.
地址 Tokyo JP