发明名称 |
Illumination optical apparatus and projection exposure apparatus |
摘要 |
An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle onto a wafer are provided. An illumination light emitted from an exposure light source in a linearly polarized state in the illumination optical system passes through first and second birefringent members having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle under an annular illuminating condition after passing through a fly-eye lens. |
申请公布号 |
US9140992(B2) |
申请公布日期 |
2015.09.22 |
申请号 |
US200611410952 |
申请日期 |
2006.04.26 |
申请人 |
NIKON CORPORATION |
发明人 |
Shiraishi Naomasa |
分类号 |
G03B27/72;G03F7/20;G02B27/28;G03B27/68;G03B27/42;G03B27/52;G03B27/54 |
主分类号 |
G03B27/72 |
代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
主权项 |
1. A projection exposure apparatus which projects an image of a pattern on a first object onto a second object, the projection exposure apparatus comprising:
a projection optical system arranged between the first object and the second object that projects the image of the pattern on the first object onto the second object; and an illumination optical system that illuminates the first object with illumination light from a light source, and comprising at least two birefringent members arranged along a traveling direction of the illumination light, wherein a direction of a fast axis of an at least one birefringent member of the at least two birefringent members is different from a direction of a fast axis of another birefringent member of the at least two birefringent members, wherein the at least one birefringent member of the at least two birefringent members has a non-uniform surface; and the at least one birefringent member changes a polarization state of the illumination light passing the at least one birefringent member to consist primarily of S-polarization when the illumination light reaches the first object after the illumination light entering into the at least one birefringent member passes the at least one birefringent member. |
地址 |
Tokyo JP |