发明名称 High vacuum OLED deposition source and system
摘要 Sources, devices, and techniques for deposition of organic layers, such as for use in an OLED, are provided. A vaporizer may vaporize a material between cooled side walls and toward a mask having an adjustable mask opening. The mask opening may be adjusted to control the pattern of deposition of the material on a substrate, such as to correct for material buildup that occurs during deposition. Material may be collected from the cooled side walls for reuse.
申请公布号 US9142778(B2) 申请公布日期 2015.09.22
申请号 US201314081161 申请日期 2013.11.15
申请人 Universal Display Corporation 发明人 Quinn William E.;Harikrishna Mohan Siddharth;McGraw Gregory
分类号 H01L51/40;H01L51/00;C23C14/04;C23C14/12;H01L51/56 主分类号 H01L51/40
代理机构 Morris & Kamlay LLP 代理人 Morris & Kamlay LLP
主权项 1. A device comprising: a first thermal vaporizer; a mask assembly comprising an adjustable mask opening and disposed not more than a distance 5 W from the first thermal vaporizer, wherein W is the width of the mask assembly; and a first plurality of cooled side walls disposed between the first thermal vaporizer and the mask assembly and defining a material sublimation region.
地址 Ewing NJ US