发明名称 |
High vacuum OLED deposition source and system |
摘要 |
Sources, devices, and techniques for deposition of organic layers, such as for use in an OLED, are provided. A vaporizer may vaporize a material between cooled side walls and toward a mask having an adjustable mask opening. The mask opening may be adjusted to control the pattern of deposition of the material on a substrate, such as to correct for material buildup that occurs during deposition. Material may be collected from the cooled side walls for reuse. |
申请公布号 |
US9142778(B2) |
申请公布日期 |
2015.09.22 |
申请号 |
US201314081161 |
申请日期 |
2013.11.15 |
申请人 |
Universal Display Corporation |
发明人 |
Quinn William E.;Harikrishna Mohan Siddharth;McGraw Gregory |
分类号 |
H01L51/40;H01L51/00;C23C14/04;C23C14/12;H01L51/56 |
主分类号 |
H01L51/40 |
代理机构 |
Morris & Kamlay LLP |
代理人 |
Morris & Kamlay LLP |
主权项 |
1. A device comprising:
a first thermal vaporizer; a mask assembly comprising an adjustable mask opening and disposed not more than a distance 5 W from the first thermal vaporizer, wherein W is the width of the mask assembly; and a first plurality of cooled side walls disposed between the first thermal vaporizer and the mask assembly and defining a material sublimation region. |
地址 |
Ewing NJ US |