发明名称 |
Graphene electronic device and method of fabricating the same |
摘要 |
The graphene electronic device may include a gate oxide on a conductive substrate, the conductive substrate configured to function as a gate electrode, a pair of first metals on the gate oxide, the pair of the first metals separate from each other, a graphene channel layer extending between the first metals and on the first metals, and a source electrode and a drain electrode on both edges of the graphene channel layer. |
申请公布号 |
US9142635(B2) |
申请公布日期 |
2015.09.22 |
申请号 |
US201414507235 |
申请日期 |
2014.10.06 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Heo Jin-seong;Chung Hyun-jong;Seo Sun-ae;Lee Sung-hoon;Yang Hee-jun |
分类号 |
H01L29/66;H01L29/78;H01L21/78;H01L29/16;H01L29/778;H01L29/786;H01L29/40 |
主分类号 |
H01L29/66 |
代理机构 |
Harness, Dickey & Pierce, P.L.C. |
代理人 |
Harness, Dickey & Pierce, P.L.C. |
主权项 |
1. A method of fabricating a graphene electronic device, the method comprising:
forming a gate oxide on a conductive substrate, the conductive substrate configured to function as a gate electrode; forming a first metal layer on the gate oxide, the first metal layer configured to function as a catalyst layer; forming a graphene layer on the first metal layer; forming a metal protection layer on the graphene layer; sequentially patterning the metal protection layer, the graphene layer, and the first metal layer using a first photoresist pattern; and exposing the graphene layer in a channel formation region by wet etching the metal protection layer and the first metal layer using a second photoresist pattern. |
地址 |
Gyeonggi-do KR |