A DEPOSITION MATERIAL PURIFICATION SYSTEM FOR SEMICONDUCTOR DEVICE

摘要

A deposition material purification system for a semiconductor element according to the present invention comprises: a base material supply unit to supply a base material of a deposition material to be deposited; a first processing unit to firstly purify the base material supplied from the base material supply unit; a second processing unit to secondly purify the deposition material processed by the first processing unit; a condenser installed on an upper portion of the second processing unit to condense the deposition material which is evaporated by the second processing unit and rises; a separator installed between the second processing unit and the condenser to separate the condensed deposition material to selectively discharge the condensed deposition material; an initial drop collection unit to discharge initial drops accumulated in the separator to collect the initial drops; a sampling unit connected to a discharge line to sample the deposition material on the discharge line processed by the first processing unit and transported from the first processing unit to the second processing unit; and an analysis and control unit to analyze and evaluate quality of the deposition material acquired by the sampling unit, and selectively control cycle repetition of the purification processes and production of a finished product according to an evaluation result.