发明名称 |
Optical system and method for measurement of one or more parameters of via-holes |
摘要 |
Obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by a non-destructive technique using an optical system having an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole, a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole, and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole. |
申请公布号 |
US9140539(B2) |
申请公布日期 |
2015.09.22 |
申请号 |
US201314021010 |
申请日期 |
2013.09.09 |
申请人 |
NOVA MEASURING INSTRUMENTS LTD. |
发明人 |
Scheiner David |
分类号 |
G01B11/00;G01B11/22;G01B11/24;G01R31/28;G06T7/00;G01B11/02;G01B11/08;G01B11/12;G01R31/311;H01L21/66 |
主分类号 |
G01B11/00 |
代理机构 |
AlphaPatent Associates Ltd. |
代理人 |
Swirsky Daniel J.;AlphaPatent Associates Ltd. |
主权项 |
1. An optical system for determining one or more parameters of at least one via-hole in an structure, the optical system comprising:
an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze data indicative of the detected light pattern and determine one or more parameters of said via-hole, wherein the illumination system and the detection system comprising at least one of polarizer or spatial filter configured to block a portion of the light pattern reflected from the region surrounding said via-hole. |
地址 |
Rehovot IL |