发明名称 Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same
摘要 Provided are an actinic-ray-sensitive or a radiation-sensitive resin composition with greater residual film ratio and capable of suppressing pattern collapse and an occurrence of bridge defects after development, and a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the same. An actinic-ray-sensitive or radiation-sensitive resin composition includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) represented by any of following General Formulae (B-1) to (B-3), and a solvent,; in General Formula (I), R0 represents a hydrogen atom or a methyl group, and R1, R2 and R3 each independently represent a straight chain or branched alkyl group.
申请公布号 US9140981(B2) 申请公布日期 2015.09.22
申请号 US201213614797 申请日期 2012.09.13
申请人 FUJIFILM Corporation 发明人 Iwato Kaoru;Takahashi Hidenori;Shirakawa Michihiro
分类号 G03F7/004;G03F7/38;C07D327/10;C07C303/32;C07C309/04;C07C309/06;C07C309/12;C07C309/17;C07C309/19;C07C309/24;G03F7/038;G03F7/039;B32B3/10;G03F7/20 主分类号 G03F7/004
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. An actinic-ray-sensitive or radiation-sensitive resin composition comprising: a resin (P) having a repeating unit (a) represented by a following General Formula (I); a compound (B) represented by any of following General Formulae (B-1) to (B-3); and a solvent, wherein the resin (P) is a resin containing 45 mol % or more of the repeating unit (a) with regard to all repeating units in the resin (P): wherein, in General Formula (I), R0 represents a hydrogen atom or a methyl group, R1, R2, and R3 each independently represent a straight chain or branched alkyl group, in General Formula (B-1), A+ represents a sulfonium cation or an iodonium cation, Rb1s, each independently, represent a hydrogen atom, a fluorine atom, or a trifluoromethyl group, n represents an integer of 1 to 4, Xb1 represents a single bond, an ether bond, an ester bond (—OCO— or —COO—) or a sulfonate bond (—OSO2— or —SO3—), Rb2 represents a substituent having 6 or more carbon atoms, in General Formula (B-2), A+ represents a sulfonium cation or an iodonium cation, Qb1 represents a group having a lactone structure, a group having a sultone structure, or a group having a cyclic carbonate structure, in General Formula (B-3), A+ represents a sulfonium cation or an iodonium cation, Lb2 represents an alkylene group having 1 to 6 carbon atoms, Xb2 represents an ether bond or an ester bond (—OCO— or —COO—), and Qb2 represents an alicyclic group or a group having an aromatic ring.
地址 Tokyo JP