| 摘要 |
<p>The present invention relates to a substrate inspection apparatus. The present invention comprises: a camera; a lighting unit; a reflective reflector; and an auxiliary reflector. The camera captures a substrate having a penetration hole. The lighting unit irradiates light toward the substrate in the same direction with an optic axis of the camera. The reflective reflector reflects the light irradiated from the lighting unit to the camera. The auxiliary reflector is disposed on an optical path between the lighting unit and the substrate and reflects the light irradiated from the lighting unit to the reflective reflector. A portion of the light irradiated from the lighting unit is reflected by the substrate to be incident to the reflective reflector, and another portion of the light irradiated from the lighting unit is reflected by an auxiliary reflector to be incident to the reflective reflector. The light reflected from the reflective reflector to the substrate is reflected by the substrate to be incident to the camera, and the camera obtains the incident light reflected by the substrate to capture the substrate.</p> |
