| 发明名称 | Method and apparatus for enhanced cleaning and inspection | ||
| 摘要 | A cleaning and inspection system includes a cleaning chamber and retaining structure disposed within the cleaning chamber and configured to secure an article to be cleaned within the cleaning chamber. The cleaning and inspection system also includes a gas distributor disposed within the cleaning chamber and configured to distribute a turbulent flow of gas into the cleaning chamber that facilitates removal of foreign particles from a surface of the article. Further, the system includes a particle collection surface positioned to collect foreign particles removed from the surface of the article. | ||
| 申请公布号 | US9138785(B2) | 申请公布日期 | 2015.09.22 |
| 申请号 | US201213542361 | 申请日期 | 2012.07.05 |
| 申请人 | Taiwan Semiconductor Manufacturing Company, Ltd. | 发明人 | Lu Chi-Lun;Chin Sheng-Chi |
| 分类号 | B08B6/00;B05C11/02;B05C13/02;A47L13/40;B08B7/02;B08B5/02;B08B7/00;G03F1/82;H01L21/67;H01L21/673 | 主分类号 | B08B6/00 |
| 代理机构 | Haynes and Boone, LLP | 代理人 | Haynes and Boone, LLP |
| 主权项 | 1. A cleaning and inspection system, comprising: a cleaning chamber; retaining structure disposed within the cleaning chamber and configured to secure an article to be cleaned within the cleaning chamber; a gas distributor disposed within the cleaning chamber and configured to distribute a turbulent flow of gas into the cleaning chamber that facilitates removal of foreign particles from a surface of the article; and a particle collection surface positioned to collect foreign particles removed from the surface of the article, wherein the particle collection surface is a silicon wafer. | ||
| 地址 | Hsin-Chu TW | ||