发明名称 |
GRID FOR PLASMA ION IMPLANT |
摘要 |
A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence. |
申请公布号 |
PH12015501433(A1) |
申请公布日期 |
2015.09.21 |
申请号 |
PH12015501433 |
申请日期 |
2015.06.19 |
申请人 |
INTEVAC, INC.;PRABHAKAR, VINAY;ADIBI, BABAK |
发明人 |
PRABHAKAR, VINAY;ADIBI, BABAK |
分类号 |
G21K5/04;G21K5/10;H01L21/265;H01L21/266;H01L21/425;H01L21/426 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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