发明名称 SEMICONDUCTOR DEVICE HAVING BURIED GATE, METHOD OF FABRICATING THE SAME, AND MODULE AND SYSTEM HAVING THE SAME
摘要 A semiconductor device includes junction regions formed in upper portions of both sidewalls of a trench formed in a semiconductor substrate, a first gate electrode buried in the trench and having a stepped upper surface, and a second gate electrode formed on the first gate electrode to overlap a junction region.
申请公布号 US2015263009(A1) 申请公布日期 2015.09.17
申请号 US201514712860 申请日期 2015.05.14
申请人 SK hynix Inc. 发明人 OH Tae Kyung;YOO Min Soo
分类号 H01L27/108;H01L21/28;H01L21/3213;H01L21/265;H01L29/423;H01L21/306 主分类号 H01L27/108
代理机构 代理人
主权项
地址 Icheon KR