发明名称 SOLID-STATE IMAGING DEVICE
摘要 Solid-state imaging device includes a photodiode in a semiconductor substrate. A color filter aligned with the photodiode on the substrate. A first reflection layer is formed on the color filter to include a concave curved surface. A transparent supporting layer is formed on the curved surface and second reflection layer is formed on the supporting layer at a position corresponding to a focal point of the concave curved surface. A planarization layer is formed on the second reflection layer and the first reflection layer. A microlens is formed on the planarization layer. The supporting layer and the planarization layer can be formed of a same resin material. The first and second reflection layers are made of materials that have a refractive index higher than a refractive index of the resin material.
申请公布号 US2015263059(A1) 申请公布日期 2015.09.17
申请号 US201514635883 申请日期 2015.03.02
申请人 Kabushiki Kaisha Toshiba 发明人 UENO Soichiro
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项 1. A solid-state imaging device, comprising: a semiconductor substrate that including a photodiode; a color filter on a first surface of the semiconductor substrate in alignment with the photodiode, the color filter transmitting light within a predetermined wavelength band; a first reflection layer on the color filter, the first reflection layer including a concave curved surface; a supporting layer on; on the concave curved surface of the first reflection layer, the supporting layer being substantially transparent to light within the predetermined wavelength band; a second reflection layer on the supporting layer at a position corresponding to a focal point of the concave curved surface of the first reflection layer for light having a wavelength within the predetermined wavelength band of the color filter; a planarization layer on the second reflection layer and the first reflection layer; and a microlens on the planarization layer, wherein the supporting layer and the planarization layer are formed of a same resin material, and the first reflection layer and the second reflection layer are made of materials that have a refractive index higher than a refractive index of the resin material.
地址 Tokyo JP