发明名称 OXYGEN-ABSORBING RESIN COMPOSITION
摘要 Provided is an oxygen-absorbing resin composition having a polyester compound having a constitutional unit (a), which has at least one tetralin ring selected from the group consisting of the following general formulas (1) to (4) and a constitutional unit (b) represented by the following general formula (5) and/or general formula (6).;
申请公布号 US2015259467(A1) 申请公布日期 2015.09.17
申请号 US201314433482 申请日期 2013.10.09
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC. 发明人 Iwamoto Shinpei;Okada Satoshi;Ikeda Shinichi;Usuda Kenichiro
分类号 C08G63/00;B65D81/26 主分类号 C08G63/00
代理机构 代理人
主权项 1. An oxygen-absorbing resin composition comprising a polyester compound having a constitutional unit (a), which has at least one tetralin ring, selected from the group consisting of the following general formulas (1) to (4) and a constitutional unit (b), which is represented by the following general formula (5) and/or general formula (6): wherein R each independently represent a monovalent substituent, the monovalent substituent being at least one selected from the group consisting of a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, a cyano group, a hydroxy group, a carboxyl group, an ester group, an amido group, a nitro group, an alkoxy group, an aryloxy group, an acyl group, an amino group, a thiol group, an alkylthio group, an arylthio group, a heterocyclic thio group and an imido group, optionally further having a substituent; wherein at least one hydrogen atom is bound to a benzyl position of the tetralin ring; wherein X represents a divalent group comprising at least one group selected from the group consisting of an aromatic hydrocarbon group, a saturated or unsaturated alicyclic hydrocarbon group and a linear or branched and saturated or unsaturated aliphatic hydrocarbon group and a heterocyclic group; wherein m each independently represent an integer of 0 to 3 and n each independently represent an integer of 0 to 6. wherein R each independently represent a monovalent substituent, the monovalent substituent being at least one selected from the group consisting of a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, a cyano group, a hydroxy group, a carboxyl group, an ester group, an amido group, a nitro group, an alkoxy group, an aryloxy group, an acyl group, an amino group, a thiol group, an alkylthio group, an arylthio group, a heterocyclic thio group and an imido group, optionally further having a substituent; wherein p each independently represent an integer of 1 to 5.
地址 Chiyoda-ku, Tokyo JP