| 发明名称 |
APPARATUS AND METHOD FOR DEPOSITING A COATING ON A SUBSTRATE AT ATMOSPHERIC PRESSURE |
| 摘要 |
An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna. |
| 申请公布号 |
US2015259802(A1) |
申请公布日期 |
2015.09.17 |
| 申请号 |
US201514657327 |
申请日期 |
2015.03.13 |
| 申请人 |
The Board of Trustees of the University of Illinois |
发明人 |
Ruzic David N.;Wu Yuilun;Shchelkanov Ivan;Hong Jungmi;Ouyang Zihao;Cho Tae Seung |
| 分类号 |
C23C16/517;C23C14/34;C23C14/22;C23C16/448;C23C16/455 |
主分类号 |
C23C16/517 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for depositing a coating on a substrate at atmospheric pressure, the apparatus comprising:
a plasma torch comprising:
a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and a target material to be coated on the substrate disposed at the tip of the antenna. |
| 地址 |
Urbana IL US |
