METHODS OF MODIFYING MASKING RETICLES TO REMOVE FORBIDDEN PITCH REGIONS THEREOF

摘要

A method is provided, in which a masking reticle including a plurality of pattern blocks is modified, the modifying including: identifying a first pattern block and a second pattern block of the plurality of pattern blocks where at least a first portion of the first pattern block and a second portion of the second pattern block are in parallel relation; and reducing a length of the first portion of the first pattern block when a transverse separation S between corresponding length edges of the first portion of the first pattern block the second portion of the second pattern block falls within a pre-defined forbidden pitch range for the masking reticle. The method may include repeating the identifying and reducing of pairs of pattern blocks on the mask reticle to remove portions of pattern block pairs spaced apart by a transverse separation falling within a forbidden-pitch range.

主权项

1. A method comprising:
obtaining a masking reticle comprising a mask pattern, the mask pattern comprising a plurality of pattern blocks, the pattern blocks oriented in a direction of a length axis; modifying the mask pattern to obtain a modified mask pattern by:
identifying a first pattern block and a second pattern block of the plurality of pattern blocks where at least a first portion of the first pattern block and a second portion of the second pattern block are in parallel relation in the direction of the length axis; andreducing a length of the first portion of the first pattern block by a length L1 when a transverse separation S between a length edge of the first portion of the first pattern block and a corresponding length edge of the second portion of the second pattern block falls within a pre-defined forbidden pitch range for the masking reticle.