发明名称 BORON-DOPED TITANIA-SILICA GLASS HAVING VERY LOW CTE SLOPE
摘要 A boron-doped titania-silica glass containing 0.1 wt % to 8.0 wt % boron, 9.0 wt % to 16.0 wt % TiO2, and 76.0 wt % to 90.9 wt % SiO2. The glass may further include F, Nb, Ta, Al, Li, Na, K, Ca, and Mg, individually or in combinations of two or more, at levels up to 4 wt %. The glass may have an OH concentration of more than 10 ppm. The glass features a CTE slope at 20° C. of less than 1 ppb/K2. The fictive temperature of the glass is less than 825° C. and the peak CTE of the glass is less than 30 ppb/K. The glass has two crossover temperatures and a wide temperature interval over which CTE is close to zero. The uniformity of each crossover temperature relative to its average over a volume of at least 50 cm3 is within ±5° C.
申请公布号 US2015259239(A1) 申请公布日期 2015.09.17
申请号 US201514637516 申请日期 2015.03.04
申请人 Corning Incorporated 发明人 Annamalai Sezhian;Duran Carlos Alberto;Hrdina Kenneth Edward
分类号 C03C3/06;C03B25/02;C03C3/097;C03C3/091;C03C3/089;C03C3/115 主分类号 C03C3/06
代理机构 代理人
主权项 1. A glass comprising 0.1 wt % to 8.0 wt % B2O3, 9.0 wt % to 16.0 wt % TiO2, and 76.0 wt % to 90.9 wt % SiO2, said glass having an expansivity slope less than 1 ppb/K2 at 20° C.
地址 Corning NY US