发明名称 POLYUREA-BASED MATERIAL, POLISHING AND GRINDING MEDIA INCLUDING THE POLYUREA-BASED MATERIAL, AND METHODS OF FORMING AND USING SAME
摘要 Polyurea-based materials suitable for grinding media and polishing media, media including the polyurea-based material, and methods of forming and using the polyurea-based material and media are disclosed. The polyurea-based material is formed using one or more secondary polyamines, which allows for slower reaction rates and produces material having desired properties.
申请公布号 US2015258660(A1) 申请公布日期 2015.09.17
申请号 US201514645150 申请日期 2015.03.11
申请人 JH Rhodes Company, Inc. 发明人 Wasilczyk George James;Daskiewich Scott
分类号 B24D3/28;C07C275/14;B24D3/32;C08G18/32 主分类号 B24D3/28
代理机构 代理人
主权项 1. A polyurea-based material for grinding or polishing a surface of a substrate, the polyurea-based material comprising: a polyurea, wherein the polyurea is formed from one or more secondary polyamines having a general formula of R[—NH—R]n, wherein n is greater than or equal to 2 and wherein R is not H and R′ is not H; and one or more of polyisocyanates, polyisocyanate derivatives, and polyisocyanate products.
地址 Tempe AZ US