发明名称 |
POLYUREA-BASED MATERIAL, POLISHING AND GRINDING MEDIA INCLUDING THE POLYUREA-BASED MATERIAL, AND METHODS OF FORMING AND USING SAME |
摘要 |
Polyurea-based materials suitable for grinding media and polishing media, media including the polyurea-based material, and methods of forming and using the polyurea-based material and media are disclosed. The polyurea-based material is formed using one or more secondary polyamines, which allows for slower reaction rates and produces material having desired properties. |
申请公布号 |
US2015258660(A1) |
申请公布日期 |
2015.09.17 |
申请号 |
US201514645150 |
申请日期 |
2015.03.11 |
申请人 |
JH Rhodes Company, Inc. |
发明人 |
Wasilczyk George James;Daskiewich Scott |
分类号 |
B24D3/28;C07C275/14;B24D3/32;C08G18/32 |
主分类号 |
B24D3/28 |
代理机构 |
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代理人 |
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主权项 |
1. A polyurea-based material for grinding or polishing a surface of a substrate, the polyurea-based material comprising:
a polyurea, wherein the polyurea is formed from one or more secondary polyamines having a general formula of R[—NH—R]n, wherein n is greater than or equal to 2 and wherein R is not H and R′ is not H; and one or more of polyisocyanates, polyisocyanate derivatives, and polyisocyanate products. |
地址 |
Tempe AZ US |