SUBSTRATE PROCESSING APPARATUS

摘要

The present invention provides a substrate processing apparatus. The substrate processing apparatus of the present invention comprises: a process chamber having a lower chamber with an opened top and an upper chamber which closes the opened top of the lower chamber; a support member which is installed within the lower chamber with a plurality of co-planar substrates being placed thereon; exhaust members which are provided at the bottom of the upper chamber opposite to the support member and which are radially extended from the center of the upper chamber; fan-shaped reaction cells which are provided at the bottom of the upper chamber and which have reaction spaces partitioned by the exhaust members; and shower head units for supplying processing gas to the substrate, the shower head units being installed in the reaction cells, wherein the exhaust members comprise first side exhaust holes formed in the lateral sides thereof, and the reaction cells comprise second side exhaust holes formed in the arc portions of the fan shapes so that exhaust streams can be formed in all directions from the center of the reaction spaces.