| 摘要 |
The invention provides devices and methods for sampling, detecting and/or characterizing particles. Devices and methods of the invention, including particle samplers, impactors and counters, include a filter component for removing particles in the exhaust flow of the device, for example, to eliminate or minimize the potential for the device itself to provide source of particles in an environment undergoing particle monitoring. This aspect of the present devices and methods is particularly useful for monitoring particles in manufacturing environments requiring low levels of particles, such as cleanroom environments for electronics manufacturing and aseptic environments for manufacturing pharmaceutical and biological products. |
