发明名称 INSULATOR FILM AND SUBSTRATE USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide an insulator film having a low thermal expansion coefficient and improved adhesion to a plating layer, and a substrate using the same.SOLUTION: An insulator film comprises a coarse grain filler 110, a fine grain filler 120, and a resin 440. The ratio between grain size distributions of the coarse grain filler 110 and the fine grain filler 120 is from 1 to 3 inclusive. Also provided is a substrate using the same. Thereby, the insulator film can be provided which has a high filler filling ratio, prevents the filler from being extruded to a junction interface with a plating layer, and realizes a low thermal expansion coefficient and improved adhesion to the plating layer.</p>
申请公布号 JP2015165548(A) 申请公布日期 2015.09.17
申请号 JP20140136583 申请日期 2014.07.02
申请人 SAMSUNG ELECTRO-MECHANICS CO LTD 发明人 PARK YE JUN;SHIM JI HYE;OH YU HONG;KIM BYUNG KUN;KIM JUN HYEONG;SEO JUNG WOOK
分类号 H05K1/03;B32B17/10;B32B27/20;H05K3/46 主分类号 H05K1/03
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