| 发明名称 |
METHOD OF FORMING PATTERN AND LAMINATE |
| 摘要 |
According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer. |
| 申请公布号 |
US2015261092(A1) |
申请公布日期 |
2015.09.17 |
| 申请号 |
US201514726780 |
申请日期 |
2015.06.01 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
HIENO Atsushi;HATTORI Shigeki;NAKAMURA Hiroko;MlKOSHIBA Satoshi;ASAKAWA Koji;KANNO Masahiro;SEINO Yuriko;AZUMA Tsukasa |
| 分类号 |
G03F7/40;G03F7/20 |
主分类号 |
G03F7/40 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of forming a pattern, comprising:
forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, the thermally crosslinkable molecule having a group that attaches to the substrate and a group that chemically binds to another material by heating; forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, the photosensitive composition layer having a surface energy which is changed by irradiation with energy rays; chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating; selectively irradiating the photosensitive composition layer with energy rays; forming a block copolymer layer including a block copolymer on the photosensitive composition layer; and forming a microphase-separated structure in the block copolymer layer. |
| 地址 |
Tokyo JP |
