| 发明名称 |
MANUFACTURING METHOD OF MAGNETIC MEMORY DEVICE AND MANUFACTURING APPARATUS OF MAGNETIC MEMORY DEVICE |
| 摘要 |
According to one embodiment, a method of manufacturing a magnetic memory device, includes accommodating, in an etching chamber, a substrate with a stacked film including a magnetic layer, etching at least a part of the stacked film in the etching chamber to form a columnar structure, and transferring the substrate with the columnar structure from the etching chamber to a transfer chamber in which a reducing purge gas is supplied. |
| 申请公布号 |
US2015263272(A1) |
申请公布日期 |
2015.09.17 |
| 申请号 |
US201414456883 |
申请日期 |
2014.08.11 |
| 申请人 |
TOMIOKA Kazuhiro |
发明人 |
TOMIOKA Kazuhiro |
| 分类号 |
H01L43/12;H01J37/32 |
主分类号 |
H01L43/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing a magnetic memory device, comprising:
accommodating, in an etching chamber, a substrate with a stacked film including a magnetic layer; etching at least a part of the stacked film in the etching chamber to form a columnar structure; and transferring the substrate with the columnar structure from the etching chamber to a transfer chamber in which a reducing purge gas is supplied. |
| 地址 |
Seoul KR |
