| 发明名称 |
Electrostatic Chuck Mechanism and Charged Particle Beam Apparatus |
| 摘要 |
Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample. |
| 申请公布号 |
US2015262857(A1) |
申请公布日期 |
2015.09.17 |
| 申请号 |
US201514626116 |
申请日期 |
2015.02.19 |
| 申请人 |
Hitachi High-Technologies Corporation |
发明人 |
EBIZUKA Yasushi;KANNO Seiichiro;YASUKOCHI Masaya;TAKAHASHI Masakazu;ISHIGAKI Naoya;MIYA Go |
| 分类号 |
H01L21/683;H01J37/20;H01J37/244;H01J37/28 |
主分类号 |
H01L21/683 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An electrostatic chuck mechanism comprising:
a first plane that is a plane of a side in which a sample is adsorbed; a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied; and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample. |
| 地址 |
Tokyo JP |
