| 摘要 |
<p>PROBLEM TO BE SOLVED: To develop practical use and applications of a new technique of fine pattern formation using a photoreactive polymer.SOLUTION: A method for manufacturing a patterned substrate is provided, which includes a preparation step and a light irradiation step. In the preparation step, a substrate is prepared, which is formed from a polymeric material containing particles. The polymeric material containing particles comprises a polymeric material that changes its volume by irradiation with light, and particles dispersed in the polymeric material. In the light irradiation step, the substrate is irradiated with light to form patterns of at least two types of regions among a first volumetric change region, a second volumetric change region, and a region with no volumetric change. The second volumetric change region has a volumetric change degree different from a volumetric change degree in the first volumetric change region.</p> |
