| 主权项 |
1. A cooling and reactant removal system for a semiconductor processing system, comprising:
a processing chamber defining a process volume and comprising one or more pedestals configured to support one or more substrates, respectively, for processing; a first gate valve having an inlet and an outlet, wherein the outlet of the first gate valve is arranged in fluid communication with the process volume of the processing chamber; a filter arranged in fluid communication with the inlet of the first gate valve; a second gate valve having an inlet and an outlet, wherein the inlet of the second gate valve is arranged in fluid communication with the process volume of the processing chamber; a gas amplifier having a first inlet, a second inlet, an outlet and at least one Coanda surface; a source of compressed gas, wherein the first inlet of the gas amplifier is in fluid communication with the compressed source of gas and wherein the compressed gas received at the first inlet is directed across the Coanda surface, wherein the second inlet of the gas amplifier is in fluid communication with the outlet of the second gate valve; and a scrubbed exhaust system, wherein the outlet of the gas amplifier is in fluid communication with the scrubbed exhaust system. |
