THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST

摘要

The present invention relates to a thinner composition for improving coating performance and removing a resist and a method for manufacturing a semiconductor device or a thin-film transistor liquid crystal display device using the same. More specifically, the composition includes 10-80 wt% of alkyl(C1-C5) 2-hydroxyisobutyrate; and 20-90 wt% of propylene glycol alkyl(C1-C5) ether acetate. With respect to the total weight of the alkyl 2-hydroxyisobutyrate and the propylene glycol alkyl ether acetate, the composition also includes 10 to 1000 ppm of a surfactant represented by the chemical formula 1. The composition shows excellent solubility regarding various photoresists and bottom anti-reflective coating (BARC) and excellent edge bead removing (EBR) performance, and is capable of being applied to a reproduction process of a wafer coated with the photoresists. The thinner composition for improving coating performance and removing a resist significantly increases the coating performance of the photoresists and the reducing resist consumption (RRC) process. The method for manufacturing a semiconductor device or a thin-film transistor liquid crystal display device includes a step of removing the photoresists using the composition.