| 发明名称 |
Metal-enolate precursors for depositing metal-containing films |
| 摘要 |
<p>Organometallic compounds suitable for use as vapor phase deposition precursors for metal-containing films are provided. Methods of depositing metal-containing films using certain organometallic precursors are also provided. Such metal-containing films are particularly useful in the manufacture of electronic devices.</p> |
| 申请公布号 |
EP2460807(B1) |
申请公布日期 |
2015.09.16 |
| 申请号 |
EP20110191340 |
申请日期 |
2011.11.30 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
NORMAN, JOHN ANTHONY THOMAS;LEI, XINJIAN |
| 分类号 |
C07F17/00;C07F7/28;C23C16/18;C23C16/40;C23C16/455 |
主分类号 |
C07F17/00 |
| 代理机构 |
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