发明名称 |
COMPOSITION AND METHOD FOR POLISHING ALUMINUM SEMICONDUCTOR SUBSTRATES |
摘要 |
<p>The invention provides a chemical-mechanical polishing composition comprising coatedα-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyls disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions.</p> |
申请公布号 |
EP2758989(A4) |
申请公布日期 |
2015.09.16 |
申请号 |
EP20120834051 |
申请日期 |
2012.09.10 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
CUI, JI;GRUMBINE, STEVEN;WHITENER, GLENN;LIN, CHIH-AN |
分类号 |
H01L21/321;C09G1/02;C09K3/14 |
主分类号 |
H01L21/321 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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