| 摘要 |
A method of controlling power output by a power supply configured to supply power to a plasma torch in a gas treatment system, the plasma torch being configured to treat effluent gas received from at least two processing chambers 40, 42 is disclosed, along with a controller 80 and the gas treatment system. The method comprises: receiving at least one input signal, the at least one input signal comprising an indication of a number of processing chambers currently supplying an effluent gas stream to the plasma torch; and in response to the at least one input signal, controlling the power output by the power supply by outputting a control signal to control a rate of flow of the plasma source gas. There is also disclosed a flow rate regulator. The regulator having a input and output manifolds and a plurality of flow channels running from said input and output manifolds. The regulator has an obstructing member operable to move and obstruct individual channels thereby varying the number of channels available for flow. |
