发明名称 薄膜を有する基材の製造方法
摘要 <p>Provided is a base material having a thin film which has a high film density, high film hardness, excellent adhesiveness to the base material and that between composition layers, high durability and high rub resistance, and does not easily generate a crack and the like even on the flexible base material. The base material has a single layer film having a configuration wherein a high film density region is sandwiched from the both sides with regions wherein the film density thereof continuously lowers in the thickness direction. Alternatively, the base material has a multilayer film composed of such single layer films. The ratio between the maximum film density value and the minimum film density value of the single layer film is 1.03-1.5.</p>
申请公布号 JP5780154(B2) 申请公布日期 2015.09.16
申请号 JP20110502682 申请日期 2010.01.22
申请人 发明人
分类号 B32B5/14;C23C16/50;C23C16/54 主分类号 B32B5/14
代理机构 代理人
主权项
地址