发明名称 半導体プロセス反応器及びその構成要素
摘要 A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.
申请公布号 JP5779174(B2) 申请公布日期 2015.09.16
申请号 JP20120504786 申请日期 2010.04.06
申请人 エイエスエム・アメリカ・インコーポレイテッドASM AMERICAINC. 发明人 シェロ,エリック;バーギース,モヒス;ホワイト,カール;ターホスト,ヘルベルト;モーリス,ダン
分类号 C23C16/455;H01L21/205 主分类号 C23C16/455
代理机构 代理人
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