一种基板处理装置,可提高一处理室的清洗能力和清洗效率且提高生产量。此种基板处理装置包含:一处理室,复数个气体供给管,将气体或电浆活性物质供给至处理室中,一远程电浆产生器,连接至气体供给管中的一个气体供给管,以及一切换阀,在这一个气体供给管设于远程电浆产生器与处理室之间以选择性地切断这一个气体供给管。; a plurality of gas supply pipes supplying gas or plasma active species into the process chamber; a remote plasma generator connected to one of the plurality of gas supply pipes; and a switching valve provided between the remote plasma generator and the process chamber at the one gas supply pipe to selectively cut off the one gas supply pipe.