| 摘要 |
A measuring apparatus, for measuring a shape of an object to be measured, comprises an emitting unit (2) configured to emit pattern light, an optical system (3) configured to guide the pattern light emitted from the emitting unit to the object, a deflection unit (4) arranged between the optical system and the object and configured to deflect the pattern light emitted from the optical system, an image sensing unit (5) configured to capture the object via the optical system and the deflection unit, and a processing unit (7) configured to determine the shape of the object based on an image of the object captured by the image sensing unit, wherein the deflection unit comprises a diffraction grating configured to diffract the pattern light emitted from the optical system. In one embodiment the distance between the diffraction grating and the object is changed in order to vary the projected pattern. In another embodiment the diffraction grating is a polarizing diffraction grating and the emitting unit further comprises a polarization convertor, such that the projected pattern can be varied. |
