碗状金属奈米结构阵列的制备方法;METHOD FOR MAKING BOWL-METAL NANOSTRUCTURE ARRAY

摘要

本发明涉及一种碗状金属奈米结构阵列的制备方法，其包括以下步骤：提供一基底；在所述基底的表面设置一金属层；在所述金属层远离基底的表面设置一图形化的掩模层，该图形化的掩模层包括复数个间隔设置的凸块，相邻的凸块之间的金属层被暴露；对上述结构进行退火处理，使每个凸块的顶面形成复数个裂纹；及采用物理性蚀刻气体和反应性蚀刻气体同时蚀刻，对应在每个凸块的位置形成一碗状金属奈米结构。本发明还涉及一种利用上述制备方法所制备的碗状金属奈米结构阵列及一种利用该碗状金属奈米结构阵列的检测系统。; providing a pattern mask layer located on a surface of the metal layer, wherein the pattern mask layer includes a plurality of protruding lumps spaced from each other; annealing and forming a plurality of flaws on a top surface of each of the plurality of protruding lumps; etching with physical and reactive etching gas, to form a bowl-metal nanostructure array. The invention also relates to a bowl- nanostructure array and a raman detecting system.