| 摘要 |
<p>A substrate processing apparatus (FPA) comprises a supply roller (5b), a chamber (CB), and a collecting roller (6b). A flexible substrate (S) formed of a resin film or stainless steel foil is carried from the supply roller (5b) to the collecting roller (6b) through the chamber (CB), and is wound around the collecting roller (6b). In the chamber (CB), a liquid is applied to the substrate (S) using a transcription device (11). The supply roller (5b) moves along a first rail (3) extending in a direction (X) perpendicular to a direction (Y) in which the substrate (S) is carried. The collecting roller (6b) moves along a second rail (4) in synchronization with the supply roller (5b). Along with these movements, the substrate (S) is moved into and out of the chamber (CB). In a chamber (CB) of another apparatus (FPA2), the substrate (S) is processed using a plasma device (12).</p> |
