Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask

摘要

A microscope is provided for space-resolved measurement of a predetermined structure. The microscope includes a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector. The optical system has two eigen polarization conditions, and the optical system includes a polarization module by which a polarization condition can be set for the electromagnetic radiation of the source of radiation, the polarization conditions corresponding to the eigen polarization conditions.

主权项

1. A microscope for space-resolved measurement of a predetermined structure, said microscope comprising
a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector, the optical system comprising a polarization module configured to set a polarization condition of the electromagnetic radiation of the source of radiation; wherein the optical system has two optical polarization conditions, the set polarization condition of the electromagnetic radiation is one of the two optical polarization conditions, the set polarization condition of the electromagnetic radiation is not changed upon impinging the structure.