发明名称 Method of investigating and correcting aberrations in a charged-particle lens system
摘要 A system of investigating aberrations in a charged particle lens system, wherein a charged particle beam is directed from a multitude of directions through a pivot point on a sample stage. An image figure is recorded for each of multiple focus settings at each beam direction setting, creating a set of registered images. This set of images is compared to reference images to derive aberrations present in the lens system without the use of an amorphous sample present.
申请公布号 US9136087(B2) 申请公布日期 2015.09.15
申请号 US201314016997 申请日期 2013.09.03
申请人 FEI COMPANY 发明人 Lazic Ivan;van Duinen Gijs;Tiemeijer Peter Christiaan
分类号 H01J37/153 主分类号 H01J37/153
代理机构 Scheinberg & Associates, PC 代理人 Scheinberg & Associates, PC ;Scheinberg Michael O.
主权项 1. A method of investigating aberrations in a charged-particle lens system, the lens system having an object space comprising an object plane and an image space comprising an image plane, whereby an object placed on said object plane can be imaged by the lens system onto said image plane, the lens system further having an entrance pupil, the method comprising: selecting a fixed pivot point on said object plane; directing a charged-particle beam through said pivot point, entrance pupil and lens system and onto said image plane, said beam having a cross-sectional area of about 30% or less of the area of the entrance pupil; changing the orientation of said beam through said pivot point, so as to trace out an entrance figure on said entrance pupil and a corresponding image figure on said image plane; registering said image figure; repeating this procedure at a series of different focus settings of the lens system, thus acquiring a set of registered image figures at different focus settings; and analyzing said set so as to derive lens aberrations therefrom.
地址 Hillsboro OR US