发明名称 Microchip and method of producing microchip
摘要 A microchip is provided. The microchip (A) includes a substrate structure including a fluid channel (2) configured to contain a sample solution, wherein the fluid channel is maintained at a pressure lower than atmospheric pressure prior to injection of the sample solution into the fluid channel.
申请公布号 US9132424(B2) 申请公布日期 2015.09.15
申请号 US201113577391 申请日期 2011.02.01
申请人 SONY CORPORATION 发明人 Watanabe Hidetoshi;Segawa Yuji
分类号 B01L99/00;B01L3/00 主分类号 B01L99/00
代理机构 K&L Gates LLP 代理人 K&L Gates LLP
主权项 1. A microchip comprising: a substrate structure including a first substrate layer and a pair of second substrate layers laminated on both sides of the first substrate layer, at least one of the second substrate layers being a gas-impermeable substrate layer including any one of a plastic material, a metal, and a ceramic, the first substrate layer including a fluid channel configured to contain a sample solution, the first substrate layer having a substrate thickness, the fluid channel including at least one injection site, at least one fluid well, and at least one fluid flow passage, the at least one injection site having an injection site thickness that is less than the substrate thickness, and the fluid channel having a pressure lower than atmospheric pressure.
地址 Tokyo JP