| 摘要 |
The present invention relates to a substrate treating apparatus including an exhaust pipe cleaning unit and an exhaust pipe cleaning method using the same. The substrate treating apparatus according to one embodiment of the present invention includes a chamber in which a substrate treating process is performed, an exhaust unit which includes an exhaust pipe to discharge the remaining gas and byproducts generated when the process is performed in the chamber, and the exhaust pipe cleaning unit which is connected to the exhaust unit and cleans the exhaust pipe. The exhaust unit includes an exhaust pipe valve which is installed in the exhaust pipe and opens or closes the exhaust pipe and a decompressing member which is installed in the exhaust pipe on the downstream in comparison with the exhaust pipe valve. The exhaust pipe cleaning unit includes a gas buffer tank, a first gas supply pipe which supplies the gas from the gas buffer tank to the exhaust pipe by connecting the gas buffer tank to the exhaust pipe, and a first supply pipe valve which is installed in the first gas supply pipe and opens or closes the first gas supply pipe. |
