发明名称 BAKING TOOL FOR IMPROVED WAFER COATING PROCESS
摘要 Baking methods and tools for improved wafer coating are described. In one embodiment, a method of dicing a semiconductor wafer including integrated circuits involves coating a surface of the semiconductor wafer to form a mask covering the integrated circuits. The method involves baking the mask with radiation from one or more light sources. The method involves patterning the mask with a laser scribing process to provide a patterned mask with gaps, exposing regions of the substrate between the ICs. The method may also involves singulating the ICs, such as with a plasma etching operation.
申请公布号 WO2015134200(A2) 申请公布日期 2015.09.11
申请号 WO2015US16647 申请日期 2015.02.19
申请人 APPLIED MATERIALS, INC. 发明人 PARK, JUNGRAE;LEI, WEI-SHENG;PAPANU, JAMES S.;EATON, BRAD;KUMAR, AJAY
分类号 H01L21/301;H01L21/78 主分类号 H01L21/301
代理机构 代理人
主权项
地址