ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE

摘要

The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition having a large focus latitude and exceptional developability, and a pattern formation method, an electronic device manufacturing method, and an electronic device using the composition. This actinic-ray-sensitive or radiation-sensitive resin composition contains a resin (P) including recurring units (i) having a radical represented by general formula (1), and a compound generating an acid upon irradiation with an actinic ray or radiation, the compound being represented by a specific formula.