| 摘要 |
The plasma processing device cleaning method, which is for removing a deposit deposited on the upper part electrode of a plasma processing device equipped with a circular electromagnet arranged on the upper part of a processing chamber and having a plurality of concentrically arranged circular coils, comprises introducing a predetermined cleaning gas into the processing chamber, applying a radio-frequency electrical power between the upper part electrode and a lower part electrode to generate a cleaning gas plasma while electrifying the plurality of coils to generate a magnetic field, and changing coil-by-coil the electrification amount whereby the plurality of coils are electrified, according to the deposit thickness distribution in the radial direction of the deposit deposited on the upper part electrode. |
