GAS BARRIER LAMINATE

摘要

This gas barrier laminate (10) is characterized in that an ultrathin metal oxide film (ALD film) (5) is formed on an inorganic oxide layer (3) using atomic layer deposition, the inorganic oxide layer (3) is formed from a metal oxide including Si and/or Al, or a metal oxynitride, and the ratio (d1/d2) of the thickness d1 of the inorganic oxide layer (3) and the thickness d2 of the ALD film (5) is 3-50. This gas barrier laminate (10) not only has high gas-barrier properties, but also has excellent productivity.