| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a processing method and apparatus of a substrate by PVD.SOLUTION: A processing method of a substrate 5 by physical vapor deposition (PVD) supplies a coolant gas to the substrate 5 so that the substrate 5 lifts from a substrate support 6 during a PVD processing. An apparatus 10 for processing a substrate by PVD includes the substrate support 6 and a coolant gas supply source for supplying the coolant gas to the substrate 5 so that the substrate 5 lifts from the substrate support 6 during the physical vapor deposition (PVD) processing, the substrate support 6 being constructed so as to lift the substrate 5 during the PVD processing.</p> |
