| 发明名称 |
METHOD AND APPARATUSES FOR REDUCING POROGEN ACCUMULATION FROM A UV-CURE CHAMBER |
| 摘要 |
Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost. |
| 申请公布号 |
US2015255285(A1) |
申请公布日期 |
2015.09.10 |
| 申请号 |
US201514717806 |
申请日期 |
2015.05.20 |
| 申请人 |
Novellus Systems, Inc. |
发明人 |
Gytri Lisa;Gordon Jeff;Lee James;Balderrama Carmen;Harris Joseph Brett;Smargiassi Eugene;Lau Stephen Yu-Hong;Kamian George D.;Xi Ming |
| 分类号 |
H01L21/223;B08B7/00;H01L21/26;B08B5/02 |
主分类号 |
H01L21/223 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method to remove outgassed porogen from a UV chamber, the method comprising:
providing a purge ring having an inlet portion and an outlet portion; heating the outlet portion; and flowing an inert gas from the inlet portion across an underside of a window to the heated outlet portion. |
| 地址 |
Fremont CA US |
